The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2018
Filed:
Oct. 23, 2015
Applicant:
Canon Anelva Corporation, Kawasaki-shi, Kanagawa-ken, JP;
Inventors:
Satoshi Yamada, Kawasaki, JP;
Ryuji Higashisaka, Kawasaki, JP;
Assignee:
CANON ANELVA CORPORATION, Kawasaki-Shi, Kanagawa-Ken, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/00 (2006.01); H01J 37/34 (2006.01); C23C 14/35 (2006.01); C23C 14/56 (2006.01);
U.S. Cl.
CPC ...
H01J 37/347 (2013.01); C23C 14/35 (2013.01); C23C 14/568 (2013.01); H01J 37/3405 (2013.01); H01J 37/3435 (2013.01); H01J 37/3455 (2013.01); H01J 37/3476 (2013.01); H01J 37/3411 (2013.01); H01J 2237/20235 (2013.01); H01J 2237/24564 (2013.01); H01J 2237/24578 (2013.01); H01J 2237/3323 (2013.01);
Abstract
A sputtering apparatus includes a vacuum chamber, a substrate holder, a target support member, a cathode magnet arranged on a side of the target support member, which is opposite to a side of a substrate held by the substrate holder, a magnet moving unit configured to adjust a distance between the cathode magnet and the target support member, a target moving unit configured to adjust a distance between the target support member and the substrate, and a control unit configured to control the target moving unit and the magnet moving unit.