The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2018
Filed:
Jun. 25, 2014
Applicant:
Lg Siltron Incorporated, Gumi-si, KR;
Inventors:
Jae Hyeong Lee, Gumi-si, KR;
Ja Young Kim, Gumi-si, KR;
Assignee:
LG SILTRON INCORPORATED, Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06T 7/00 (2017.01); H01L 21/66 (2006.01); G06T 7/60 (2017.01);
U.S. Cl.
CPC ...
G06T 7/0006 (2013.01); G06T 7/60 (2013.01); H01L 22/12 (2013.01); G06T 2207/10061 (2013.01); G06T 2207/30148 (2013.01);
Abstract
A method for analyzing the shape of a wafer according to an embodiment comprises the steps of: acquiring a sectional image showing a wafer to be analyzed; finding a coordinate row of the surface contour of the wafer in the sectional image; and obtaining shape analysis data, including information about the shape of the wafer, using the coordinate row.