The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 27, 2018

Filed:

Nov. 14, 2016
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventor:

Ryo Koizumi, Saitama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70433 (2013.01); G03F 7/70425 (2013.01); G03F 7/70466 (2013.01); G03F 7/70475 (2013.01); G03F 7/70483 (2013.01); G03F 7/70525 (2013.01); G03F 7/70725 (2013.01);
Abstract

This invention provides an exposure apparatus for exposing each of a plurality of shot regions on a substrate. The exposure apparatus includes a control unit configured to control exposure processing of exposing each of the plurality of shot regions on the substrate using control information for controlling shapes of the shot regions exposed on the substrate such that the plurality of shot regions are adjacent to each other. The control information includes correction information for correcting, based on layout information of a plurality of shots adjacent to each other, a shift of adjacent portions of the plurality of shot regions caused by a distortion of the shapes of the plurality of shot regions. The control unit controls the exposure processing using the correction information.


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