The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2018
Filed:
May. 04, 2016
National Sun Yat-sen University, Kaohsiung, TW;
Landmark Optoelectronics Corporation, Tainan, TW;
Yung-Jr Hung, Kaohsiung, TW;
Wei Lin, Tainan, TW;
NATIONAL SUN YAT-SEN UNVIERSITY, Kaohsiung, TW;
LANDMARK OPTOELECTRONICS CORPORATION, Tainan, TW;
Abstract
An interference lithography device is provided with a laser source for providing a laser beam; a base thereon having a beam splitter for dividing the laser beam into a first beam portion and a second beam portion, a beam expander, a first set of reflectors, and a second set of reflectors; a set of lower reflectors; and a sample carrying stage for holding a substrate. The first beam portion and the second beam portion are respectively reflected from the second set of reflectors and then respectively reflected by the set of lower reflectors to form an interference pattern on the substrate.