The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 27, 2018

Filed:

Feb. 17, 2015
Applicant:

Samsung Display Co., Ltd., Yongin, Gyeonggi-Do, KR;

Inventors:

Eun Ae Kwak, Gunpo-si, KR;

Min Hyuck Kang, Seoul, KR;

Moon Gyu Lee, Suwon-si, KR;

Assignee:

SAMSUNG DISPLAY CO., LTD., Gyeonggi-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/30 (2006.01); C09K 13/00 (2006.01); C23F 4/00 (2006.01); H01L 21/308 (2006.01); G02F 1/1335 (2006.01); H01L 21/3065 (2006.01); B81C 1/00 (2006.01); G03F 7/004 (2006.01); H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
G02B 5/3058 (2013.01); C09K 13/00 (2013.01); C23F 4/00 (2013.01); B81C 1/00388 (2013.01); B81C 1/00404 (2013.01); B81C 2201/0149 (2013.01); G02F 2001/133548 (2013.01); G03F 7/0041 (2013.01); H01L 21/3065 (2013.01); H01L 21/3081 (2013.01); H01L 21/3083 (2013.01); H01L 21/3086 (2013.01); H01L 21/3088 (2013.01); H01L 21/30604 (2013.01);
Abstract

A method of fabricating a wire grid polarizer includes sequentially depositing a conductive wire pattern layer, and a plurality of guide patterns which forms one or more trenches therebetween on the conductive wire pattern layer, hydrophobically treating surfaces of the conductive wire pattern layer exposed in the trenches, and the guide patterns, coating the hydrophobically treated conductive wire pattern layer in the trenches with a neutral layer to partially fill the trenches, filling a remainder of the trenches with a block copolymer of two monomers with different etching rates, aligning the block copolymer filled in the trenches, selectively removing blocks of one monomer among the two monomers from the aligned block copolymer, and patterning the conductive wire pattern layer by using blocks of the other monomer among the two monomers remaining in the trenches and the guide patterns as a mask.


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