The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 27, 2018

Filed:

Mar. 03, 2016
Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Naoya Shibata, Kanagawa, JP;

Miho Asahi, Kanagawa, JP;

Hajime Nakayama, Kanagawa, JP;

Ayako Matsumoto, Kanagawa, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G02B 27/00 (2006.01); G02B 1/118 (2015.01); G02B 1/111 (2015.01); G02B 1/14 (2015.01); G02B 5/30 (2006.01); C03C 17/00 (2006.01);
U.S. Cl.
CPC ...
G02B 1/118 (2013.01); C03C 17/007 (2013.01); C03C 17/008 (2013.01); G02B 1/111 (2013.01); G02B 1/14 (2015.01); G02B 5/3033 (2013.01); C03C 2217/43 (2013.01); C03C 2217/445 (2013.01); C03C 2217/465 (2013.01); C03C 2217/475 (2013.01); C03C 2217/478 (2013.01); C03C 2217/732 (2013.01);
Abstract

An antireflection article includes a substrate; and an antireflection layer containing a binder resin and inorganic particles, wherein the inorganic particles are particles having an average primary particle diameter of 150 nm to 250 nm and a CV value of 4% or less, 99.9% or more of the inorganic particles are perfectly spherical particles, the antireflection layer includes a moth eye structure composed of an unevenness shape formed by the inorganic particles on a surface of the antireflection layer, and an area occupancy ratio of the inorganic particles on the surface of the antireflection layer is 25% to 64%.


Find Patent Forward Citations

Loading…