The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 27, 2018

Filed:

Dec. 22, 2014
Applicant:

Youtec Co., Ltd., Chiba, JP;

Inventors:

Takeshi Kijima, Chiba, JP;

Yuuji Honda, Chiba, JP;

Takekazu Shigenai, Chiba, JP;

Hiroyuki Ogihara, Chiba, JP;

Assignee:

YOUTEC CO., LTD., Chiba, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 33/00 (2010.01); G01R 29/22 (2006.01); H05B 3/00 (2006.01); H01L 41/257 (2013.01); H01L 41/318 (2013.01);
U.S. Cl.
CPC ...
G01R 29/22 (2013.01); H01L 41/257 (2013.01); H01L 41/318 (2013.01); H05B 3/0038 (2013.01);
Abstract

A thermal poling method in which a poling treatment can be performed easily by a dry process. The poling treatment is performed on a PZT film by performing a heat treatment on the PZT film under a pressurized oxygen atmosphere at a temperature of 400° C. or more and 900° C. or less. The PZT film before the heat treatment has a single-domain crystal structure, and the PZT film after the heat treatment has a multi-domain crystal structure.


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