The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 27, 2018

Filed:

Aug. 09, 2013
Applicant:

Koninklijke Philips N.v., Eindhoven, NL;

Inventors:

Gereon Vogtmeier, Aachen, DE;

Udo Van Stevendaal, Ahrensburg, DE;

Assignee:

KONINKLIJKE PHILIPS N.V., Eindhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/04 (2006.01); G01N 23/20 (2018.01); A61B 6/00 (2006.01); G21K 1/06 (2006.01); A61B 6/02 (2006.01);
U.S. Cl.
CPC ...
G01N 23/20075 (2013.01); A61B 6/484 (2013.01); A61B 6/582 (2013.01); A61B 6/587 (2013.01); G01N 23/04 (2013.01); G21K 1/067 (2013.01); A61B 6/025 (2013.01); A61B 6/4441 (2013.01); A61B 6/502 (2013.01); G01N 2223/323 (2013.01);
Abstract

The present invention relates to handling misalignment in differential phase contrast imaging. In order to provide an improved handling of misalignment in X-ray imaging systems for differential phase contrast imaging, an X-ray imaging system () for differential phase contrast imaging is provided that comprises a differential phase contrast setup () with an X-ray source (), an X-ray detector (), and a grating arrangement comprising a source grating (), a phase grating () and an analyzer grating (). The source grating is arranged between the X-ray source and the phase grating, and the analyzer grating is arranged between the phase grating and the detector. Further, the system comprises a processing unit (), and a measurement system () for determining a misalignment of at least one of the gratings. The X-ray source and the source grating are provided as a rigid X-ray source unit (). The phase grating, the analyzer grating and the detector are provided as a rigid X-ray detection unit (). The measurement system is an optical measurement system configured to determine a misalignment between the differential phase contrast setup consisting of the X-ray source unit and the X-ray detection unit. Further, the processing unit is configured to provide a correction signal () based on the determined misalignment.


Find Patent Forward Citations

Loading…