The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2018
Filed:
Apr. 26, 2007
Roelof Marissen, Born, NL;
Joseph Arnold Paul Maria Simmelink, Sittard, NL;
Reinard Jozef Maria Steeman, Elsloo, NL;
Gijsbertus Hendrikus Maria Calis, Hulsberg, NL;
Jacobus Johannes Mencke, Maastricht, NL;
Jean Hubert Marie Beugels, Landgraaf, NL;
David Vanek, Charlotte, NC (US);
Johann Van Elburg, Landgraaf, NL;
Alexander Volker Peters, Aachen, DE;
Steen Tanderup, Maastricht, NL;
Marko Dorschu, Beek, NL;
Roelof Marissen, Born, NL;
Joseph Arnold Paul Maria Simmelink, Sittard, NL;
Reinard Jozef Maria Steeman, Elsloo, NL;
Gijsbertus Hendrikus Maria Calis, Hulsberg, NL;
Jacobus Johannes Mencke, Maastricht, NL;
Jean Hubert Marie Beugels, Landgraaf, NL;
David Vanek, Charlotte, NC (US);
Johann Van Elburg, Landgraaf, NL;
Alexander Volker Peters, Aachen, DE;
Steen Tanderup, Maastricht, NL;
Marko Dorschu, Beek, NL;
DSM IP ASSETS B.V., Heerlen, NL;
Abstract
The invention relates to a multilayered material sheet comprising a consolidated stack of unidirectional monolayers of drawn polymer. The draw direction of two subsequent monolayers in the stack differs. Moreover the strength to thickness ratio of at least one monolayer is larger than 4.5.10N/m. The invention also relates to a ballistic resistant article comprising the multilayered material sheet and to a process for the preparation of the ballistic resistant article.