The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 27, 2018

Filed:

Oct. 29, 2015
Applicant:

Kabushiki Kaisha Saginomiya Seisakusho, Tokyo, JP;

Inventors:

Kenichi Matsuyama, Tokorozawa, JP;

Satoshi Miyakawa, Tokorozawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01H 35/24 (2006.01); F16K 17/02 (2006.01); F16K 37/00 (2006.01); F16K 7/16 (2006.01);
U.S. Cl.
CPC ...
F16K 17/02 (2013.01); F16K 7/16 (2013.01); F16K 37/005 (2013.01); F16K 37/0041 (2013.01);
Abstract

The present invention provides a swaging structure having a high pressure resistance strength suitable for a high pressure switch that solves the conventional disadvantages that the swaging for providing an increased thickness causes a manufacturing facility having a larger size or the swaged part having winkles or that a pressure switch finds a difficulty in the adjustment of the swaging margin when the number of diaphragms is changed for example. A swaging structure comprises at least a to-be-swaged member required to have airtightness to a surrounding environment and a swaging member configured to retain the to-be-swaged member by a swaging processing, the swaging member has an annular side wall surrounding the to-be-swaged member to retain the to-be-swaged member after the swaging processing and the swaging structure further includes an annular spacer including therein a penetration hole to be sandwiched between the to-be-swaged member and the annular side wall after the swaging processing.


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