The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 27, 2018

Filed:

Dec. 09, 2015
Applicants:

Samsung Display Co., Ltd, Yongin-si, Gyeonggi-do, KR;

Ltcam Co., Ltd., Pyeongtack-si, Gyeonggi-do, KR;

Inventors:

Dong Eon Lee, Yongin-si, KR;

Jin Ho Ju, Yongin-si, KR;

Jun Hyuk Woo, Yongin-si, KR;

Seok Ho Lee, Yongin-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 7/32 (2006.01); C11D 7/08 (2006.01); C11D 7/26 (2006.01); C11D 11/00 (2006.01); C11D 3/39 (2006.01); C11D 3/395 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C11D 7/3245 (2013.01); C11D 3/3947 (2013.01); C11D 3/3956 (2013.01); C11D 7/08 (2013.01); C11D 7/265 (2013.01); C11D 7/3209 (2013.01); C11D 11/0047 (2013.01); H01L 21/02057 (2013.01);
Abstract

There is provided a cleaner composition for a process of manufacturing a semiconductor and a display. The cleaner composition includes 0.01 to 5.0 wt % of amino acid-based chelating agent, 0.01 to 1.5 wt % of organic acid, 0.01 to 1.0 wt % of inorganic acid, 0.01 to 5.0 wt % of alkali compound, and the balance of deionized water and is based on acidic water with pH levels of 1 to 5. The cleaner composition may enhance metal contaminants removal capability and have a function to remove particles and organic contaminants, and prevent corrosion of copper and reverse adsorption of copper. Thus, cleaner composition may be used for various purposes of etching copper, removing residues, and a cleaner by adjusting an etch rate.


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