The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2018
Filed:
May. 09, 2016
Korea Institute of Science and Technology, Seoul, KR;
Jong Suk Lee, Seoul, KR;
Seung Sang Hwang, Seoul, KR;
Sunghwan Park, Seoul, KR;
Albert Sung Soo Lee, Seoul, KR;
Korea Institute of Science and Technology, Seoul, KR;
Abstract
Provided is a composition for use in fabricating a carbon molecular sieve membrane, including a fluorine-containing polymer matrix and polysilsesquioxane. The composition shows high selectivity to the gas to be separated and high separation quality by controlling the mixing ratio of the fluorine-containing polymer matrix with polysilsesquioxane as well as the type of fluorine-containing polymer matrix and polysilsesquioxane. Ancillary selective pore formation is enhanced by a so-called 'autogenous fluorinated gas induced siloxane etching' (A-FISE) mechanism of fluorine-containing polymer/polysilsesquioxane blend precursors during carbonization. Therefore, it is possible to effectively separate gases having a small difference in particle size, which, otherwise, are difficult to be separated with the conventional polymer membranes.