The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2018
Filed:
Feb. 01, 2017
Infineon Technologies Ag, Neubiberg, DE;
Cristian Gozzi, Santa Clara, CA (US);
Guillaume Bigny, San Jose, CA (US);
Infineon Technologies AG, Neubiberg, DE;
Abstract
A semiconductor includes a semiconductor substrate having first and second opposite facing surfaces. An amplifier device is formed in the semiconductor substrate, the amplifier device is configured to amplify an RF signal at a fundamental frequency. A first dielectric layer is formed on the first surface of the substrate. A first metallization layer is formed on the first dielectric layer. The first metallization layer is spaced apart from the substrate by the first dielectric layer. The first metallization layer includes a first elongated finger interdigitated with a first reference potential pad. The first elongated finger is physically disconnected from the first reference potential pad. The first reference potential pad includes a first patterned shape that is devoid of metallization. The first patterned shape has a geometry that filters harmonic components of the fundamental frequency.