The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2018
Filed:
Nov. 19, 2016
Hitachi High-tech Science Corporation, Tokyo, JP;
Hideyuki Akiyama, Tokyo, JP;
Kentaro Yamada, Tokyo, JP;
Masafumi Watanabe, Tokyo, JP;
Toshitada Takeuchi, Tokyo, JP;
Kantaro Maruoka, Tokyo, JP;
HITACHI HIGH-TECH SCIENCE CORPORATION, Tokyo, JP;
Abstract
Disclosed herein is a method for analyzing evolved gas and an evolved gas analyzer, the method correcting detection sensitivity differences in analysis devices, day-to-day variations thereof, thereby quantifying a measurement target with high accuracy. The method for analyzing evolved gas of the apparatus including: a sample holder; a heating unit evolving a gas component; an ion source generating ions by ionizing the gas component; a mass spectrometer detecting the gas component; and a gas channel through which mixed gas flows, the method including: operating a discharged flow rate controlling process of controlling a flow rate of the mixed gas discharged to outside; operating a sample holder cooling process of cooling the sample holder by bringing the sample holder into contact with a cooling unit; and operating a correction process including: correcting a mass spectrum position; calculating a sensitivity correction factor; and calculating a heating correction factor.