The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2018
Filed:
Feb. 21, 2017
Hitachi, Ltd., Tokyo, JP;
National University Corporation Hokkaido University, Sapporo-shi, Hokkaido, JP;
Taisuke Takayanagi, Tokyo, JP;
Shinichiro Fujitaka, Tokyo, JP;
Chihiro Nakashima, Tokyo, JP;
Tomoki Murata, Tokyo, JP;
Taeko Matsuura, Sapporo, JP;
Naoki Miyamoto, Sapporo, JP;
Kikuo Umegaki, Sapporo, JP;
Yuichi Hirata, Sapporo, JP;
Hitachi, Ltd., Tokyo, JP;
National University Corporation Hokkaido University, Hokkaido, JP;
Abstract
A structure configuring a ridge filter has line symmetry about a line vertical to a depth direction passing the center of the structure. A small structure obtained in such a way that the structure is divided by this line has a bilaterally asymmetric shape about a center line in an iterative direction, and has a point symmetric shape about an intersection between the center line in the iterative direction and the center line in the depth direction. Thicknesses in the iterative direction of an uppermost stream surface and a lowermost stream surface in the depth direction are equal to each other. The structure is configured so that a thick portion in the iterative direction of the uppermost stream surface and the lowermost stream surface is not present in the depth direction.