The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 20, 2018

Filed:

Mar. 13, 2017
Applicant:

Toshiba Memory Corporation, Minato-ku, Tokyo, JP;

Inventors:

Tomoyuki Takeishi, Kawasaki, JP;

Hirokazu Kato, Yokohama, JP;

Shinichi Ito, Yokohama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); G03F 7/09 (2006.01); H01L 21/027 (2006.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01); G03F 7/20 (2006.01); G03F 7/16 (2006.01); G03F 7/039 (2006.01); G03F 7/38 (2006.01); G03F 7/11 (2006.01); G03F 7/004 (2006.01); G03F 7/30 (2006.01);
U.S. Cl.
CPC ...
G03F 7/094 (2013.01); G03F 7/0045 (2013.01); G03F 7/0392 (2013.01); G03F 7/091 (2013.01); G03F 7/11 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2006 (2013.01); G03F 7/2022 (2013.01); G03F 7/2041 (2013.01); G03F 7/30 (2013.01); G03F 7/38 (2013.01); H01L 21/02052 (2013.01); H01L 21/0276 (2013.01); H01L 21/67023 (2013.01);
Abstract

A pattern forming method includes forming a spin on dielectric film on a substrate, washing the spin on dielectric film by using a washing liquid, drying a surface of the spin on dielectric film after the washing, forming a photosensitive film on the dried coating type insulation film, emitting energy rays to a predetermined position of the photosensitive film in order to form a latent image on the photosensitive film, developing the photosensitive film in order to form a photosensitive film pattern which corresponds to the latent image, and processing the spin on dielectric film with the photosensitive film pattern serving as a mask.


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