The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 20, 2018

Filed:

Jan. 15, 2016
Applicant:

Nikon Corporation, Tokyo, JP;

Inventors:

Hiroaki Nakayama, Kawasaki, JP;

Yumiko Ouchi, Yokohama, JP;

Assignee:

NIKON CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F21V 9/16 (2006.01); G02B 21/06 (2006.01); G01N 21/64 (2006.01); G02B 21/00 (2006.01); G02B 21/36 (2006.01); G02B 27/58 (2006.01); G02B 21/16 (2006.01);
U.S. Cl.
CPC ...
G02B 21/06 (2013.01); G01N 21/64 (2013.01); G01N 21/6428 (2013.01); G02B 21/0032 (2013.01); G02B 21/0076 (2013.01); G02B 21/16 (2013.01); G02B 21/367 (2013.01); G02B 27/58 (2013.01); G01N 2021/6439 (2013.01); G01N 2201/063 (2013.01); G01N 2201/0638 (2013.01);
Abstract

A structured illumination device includes: a diffraction unit that diffracts light beams of a plurality of wavelengths that are emitted simultaneously or sequentially by a light source into a plurality of diffracted beams; and an optical system that forms interference fringes on a surface of a sample using the plurality of diffracted beams diffracted by the diffraction unit, the optical system including a first optical system and a second optical system that focuses the plurality of diffracted beams at positions on or near a pupil plane of the first optical system, and a magnification characteristic dY(λ) of the second optical system satisfying the condition of (fo·nw−afλ/P)≦dY(λ)≦(fo·NA−afλ/P), where a=1 (for M=1, 2) or a=2 (for M=3).


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