The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 20, 2018

Filed:

Mar. 13, 2015
Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Shunya Katoh, Minami-ashigara, JP;

Takao Taguchi, Minami-ashigara, JP;

Kazuhiro Oki, Minami-ashigara, JP;

Masaru Yoshikawa, Minami-ashigara, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/28 (2006.01); C07D 487/04 (2006.01); C07D 487/22 (2006.01); G02B 5/26 (2006.01); G02B 5/20 (2006.01); G02B 5/22 (2006.01); G02B 1/04 (2006.01); G02F 1/1333 (2006.01);
U.S. Cl.
CPC ...
G02B 5/282 (2013.01); C07D 487/04 (2013.01); C07D 487/22 (2013.01); G02B 1/04 (2013.01); G02B 5/206 (2013.01); G02B 5/208 (2013.01); G02B 5/223 (2013.01); G02B 5/26 (2013.01); G02F 1/133365 (2013.01); Y10T 428/25 (2015.01); Y10T 428/31616 (2015.04); Y10T 428/31797 (2015.04);
Abstract

An infrared ray cutting film having a transparent base, a near infrared ray absorbing layer containing a compound of Formula (1) with a maximum absorption wavelength of from 750 nm to 920 nm, and a near infrared ray reflection layer obtained by fixing a cholesteric liquid crystal phase is excellent in invisibility, robustness and high heat shielding performance. Rand Rrepresent alkyl, aryl or heteroaryl; at least one of Rand Ris an electron-withdrawing group, and Rrepresents H, alkyl, aryl, heteroaryl, substituted boron, or a metal.


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