The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 20, 2018

Filed:

Mar. 08, 2017
Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Akihiko Ohtsu, Ashigarakami-gun, JP;

Hideki Yasuda, Ashigarakami-gun, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01S 7/495 (2006.01); G01S 7/38 (2006.01); G02B 1/00 (2006.01); F41H 3/00 (2006.01);
U.S. Cl.
CPC ...
G01S 7/495 (2013.01); F41H 3/00 (2013.01); G01S 7/38 (2013.01); G02B 1/002 (2013.01);
Abstract

In an electromagnetic cloaking structure, a refractive index distribution has a high refractive index region which is provided around a shielding space and has a maximum value in a plane surrounding the shielding space and in which a refractive index decreases gradually from the centroid of the shielding space along a radial line passing through the plane so as to be close to an average refractive index and a low refractive index region which has a minimum value at two points having the shielding space and the high refractive index region interposed therebetween on a virtual optical axis passing through the shielding space and in which the refractive index increases gradually from the two points in a direction opposite to the high refractive index region on the virtual optical axes, on which the two points are placed, so as to be close to the average refractive index.


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