The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2018
Filed:
Nov. 19, 2016
Hitachi High-tech Science Corporation, Tokyo, JP;
Hideyuki Akiyama, Tokyo, JP;
Kantaro Maruoka, Tokyo, JP;
HITACHI HIGH-TECH SCIENCE CORPORATION, Tokyo, JP;
Abstract
Disclosed herein is a method for correcting an evolved gas analyzer and the evolved gas analyzer. The method includes: correcting a mass spectrum position to be located at a reference spectrum position, the mass spectrum position corresponding to a mass-to-charge ratio m/z of a mass spectrum of a gas component of a reference sample; calculating a sensitivity correction factor Cs=Ss/S by using an area S and a reference area Ss of a chromatogram, the sensitivity correction factor being used to measure an area of a chromatogram of the gas component of a test sample; and calculating a heating correction factor H=t/ts by using a time t and a reference time is indicating a maximum peak of the chromatogram about the reference sample, the heating correction factor being used to correct a heating rate of the test sample when measuring the gas component of the test sample.