The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2018
Filed:
Oct. 13, 2016
Fujifilm Corporation, Tokyo, JP;
Takahiro Hayashi, Fujinomiya, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
The present invention provides a stress measuring method including: irradiating a photoelastic product including a measurement subject with light penetrating a linear polarizing film and a phase difference film in this order, and detecting reflected light from the product which is derived from the light via the phase difference film and the linear polarizing film in this order, in which in-plane retardation Re (550) of the phase difference film with light having a wavelength of 550 nm satisfies 100 nm≦Re (550 nm)≦700 nm, and in-plane retardation Re (450) of the phase difference film with light having a wavelength of 450 nm satisfies Re (450)/Re (550)≧0.9, a stress measuring member including the linear polarizing film and the phase difference film, and a stress measuring set including the stress measuring member and a stress displaying member including a photoelastic layer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile