The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2018
Filed:
Feb. 10, 2015
Primetals Technologies Japan, Ltd., Tokyo, JP;
Nisshin Steel Co., Ltd., Tokyo, JP;
Hideaki Suemori, Hiroshima, JP;
Masayoshi Tanaka, Hiroshima, JP;
Norikatsu Kakemizu, Hiroshima, JP;
Takashi Yamamoto, Saijo, JP;
Hisao Morishita, Saijo, JP;
Ryuuichi Yamashita, Saijo, JP;
PRIMETALS TECHNOLOGIES JAPAN, LTD., Tokyo, JP;
NISSHIN STEEL CO., LTD., Tokyo, JP;
Abstract
The present invention is provided with: a duct of which one end interconnects to a wiping nozzle () and the other end is open; a first valve () that controls the actual gas pressure (P') of the wiping nozzle (); a second valve () that controls the gas flow rate (Q) dissipating to outside the system from another branched duct; a wiping pressure setting unit () that sets the set gas pressure (P) of the wiping nozzle (); a first valve aperture setter () that sets the valve aperture of the first valve (); a second valve aperture setter () that sets the valve aperture of the second valve (); and a computation processing unit () that presents to the first valve aperture setter () the valve aperture at which the gas pressure (P′) matches a set gas pressure (P), and presents to the second valve aperture setter () the valve aperture at which the total gas flow rate (QT) supplied from a gas supply device () becomes uniform.