The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2018
Filed:
Mar. 02, 2015
Applicant:
Nippon Shokubai Co., Ltd., Osaka-shi, Osaka, JP;
Inventors:
Assignee:
NIPPON SHOKUBAI CO., LTD., Osaka-Shi, Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 20/06 (2006.01); C08F 2/10 (2006.01); C08F 220/06 (2006.01); B01J 20/26 (2006.01);
U.S. Cl.
CPC ...
C08F 220/06 (2013.01); B01J 20/261 (2013.01); C08F 2/10 (2013.01);
Abstract
The present invention provides a method for producing, by adding an additive and/or gas bubbles to a monomer with high efficiency, a polyacrylic acid (salt)-based water-absorbing resin having high physical properties while high productivity is maintained. The step of preparing an aqueous monomer solution includes the steps of: preparing an aqueous solution; and adding a water-insoluble additive and/or gas bubbles. A retention time from when the water-insoluble additive and/or the gas bubbles is/are added to when polymerization starts is 1 second to 60 seconds.