The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2018
Filed:
Jun. 09, 2015
Mainstream Engineering Corporation, Rockledge, FL (US);
Gregory Chester, Orlando, FL (US);
Justin J. Hill, Merritt Island, FL (US);
Mainstream Engineering Corporation, Rockledge, FL (US);
Abstract
A reactor and method for seeded growth of nano-products such as carbon nanotubes, wires and filaments in which selected precursors are introduced into the reactor which is heated to a temperature sufficient to induce nano-product formation from interaction between the precursor gases and a nanopore templated catalyst. The selected precursors are segregated in the reactor through a plate defining two chambers which are sealed off from each other except for a void space provided in the plate. The void space is closed off by a membrane having nanopores and a catalyst formed as a layer. Atomic transfer of material from the selected precursors to form the nano-products on the catalyst layer in the other of the chambers occurs by diffusion through the catalyst layer to form the nano-product on the other of the chambers absent a pressure drop between the two chambers.