The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 13, 2018

Filed:

Aug. 13, 2014
Applicant:

Sumitomo Electric Industries, Ltd., Osaka-shi, JP;

Inventor:

Takeyoshi Masuda, Osaka, JP;

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/15 (2006.01); H01L 31/0312 (2006.01); H01L 29/78 (2006.01); H01L 21/3065 (2006.01); H01L 21/308 (2006.01); H01L 29/16 (2006.01); H01L 21/04 (2006.01); H01L 29/423 (2006.01); H01L 29/66 (2006.01); H01L 29/06 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7813 (2013.01); H01L 21/049 (2013.01); H01L 21/3065 (2013.01); H01L 21/3083 (2013.01); H01L 29/0696 (2013.01); H01L 29/1608 (2013.01); H01L 29/4236 (2013.01); H01L 29/42368 (2013.01); H01L 29/66068 (2013.01);
Abstract

A silicon carbide semiconductor device includes a silicon carbide semiconductor layer having a main surface, the main surface of the silicon carbide semiconductor layer being provided with a trench having a closed shape when seen in plan view, the trench including a bottom, a plurality of sidewalls continuous with the bottom, and a sidewall-connecting corner portion at a connection portion between two adjacent sidewalls of the plurality of sidewalls, the silicon carbide semiconductor device further including a gate insulating film covering the bottom and the sidewalls of the trench, and a gate electrode provided on the gate insulating film, between the bottom and an upper end of the trench, the thickness of the gate insulating film at the sidewall-connecting corner portion of the trench being greater than the thickness of the gate insulating film at a portion other than the sidewall-connecting corner portion.


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