The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 13, 2018
Filed:
Mar. 27, 2017
Applicants:
SK Hynix Inc., Gyeonggi-do, KR;
Geun Su Lee, Gyeonggi-do, KR;
Inventors:
Ji Won Moon, Gyeonggi-do, KR;
Jin Wook Jang, Chungcheongbuk-do, KR;
Sang Youl Yi, Gyeonggi-do, KR;
Sung Jae Lee, Gyeonggi-do, KR;
Geun Su Lee, Gyeonggi-do, KR;
Young Sun Lee, Gyeonggi-do, KR;
Min Su Kim, Gyeonggi-do, KR;
Assignee:
SK Hynix Inc., Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/58 (2006.01); H01L 21/768 (2006.01); H01L 21/28 (2006.01); H01L 21/311 (2006.01); H01L 21/04 (2006.01); C08G 77/18 (2006.01); C08G 77/20 (2006.01); C08G 77/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76861 (2013.01); C08G 77/18 (2013.01); C08G 77/20 (2013.01); C08G 77/80 (2013.01); H01L 21/048 (2013.01); H01L 21/28 (2013.01); H01L 21/311 (2013.01);
Abstract
A gap-fill polymer for filling fine pattern gaps, which has a low dielectric constant (low-k) and excellent gap filling properties, may consist of a compound formed by condensation polymerization of a first oligomer represented by the formula 1 and a second oligomer represented by the formula 2.