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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9892959 B1

PDFFull Text
Date of Patent:
Feb. 13, 2018

Filed:

Jun. 29, 2016

Method for patterning mesoporous inorganic oxide film, and electric device including mesoporous inorganic oxide film patterned by the same

Applicant:

Industry-academic Cooperation Foundation, Yonsei University, Seoul, KR;

Inventors:

Eun Kyoung Kim, Seoul, KR;

Jong Hak Kim, Seoul, KR;

Jeong Hun Kim, Seoul, KR;

Jong Kwan Koh, Seoul, KR;

Jong Beom Na, Seoul, KR;

Chi Hyun Park, Suwon-si, KR;

Assignee:

INDUSTRY-ACADEMIC CORPORATION FOUNDATION, YONSEI UNIVERSITY, , KR;

Attorney:

Renaissance IP Law Group LLP

Primary Examiner:

Jack Chen

Int. Cl.
CPC ...
H01L 21/31 (2006.01); H01L 21/768 (2006.01); H01G 9/20 (2006.01); H01L 29/78 (2006.01); H01G 9/00 (2006.01); H01L 21/02 (2006.01); H01L 51/05 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76817 (2013.01); H01G 9/0029 (2013.01); H01G 9/204 (2013.01); H01G 9/2022 (2013.01); H01G 9/2031 (2013.01); H01L 21/02172 (2013.01); H01L 21/02356 (2013.01); H01L 29/78 (2013.01); H01L 51/0508 (2013.01); Y02E 10/542 (2013.01); Y02P 70/521 (2015.11);
Abstract

Provided are a method for patterning a mesoporous inorganic oxide film, the method including a step of forming a mesoporous inorganic oxide film using a composition containing inorganic oxide particles; and a step of forming a pattern on the mesoporous inorganic oxide film using an elastic stamp for pattern formation, and then calcining the mesoporous inorganic oxide, and an electronic device including a mesoporous inorganic oxide film that has been patterned by the patterning method.

Find Patent Forward Citations

Kim, Eun. (2018). Method for patterning mesoporous inorganic oxide film, and electric device including mesoporous inorganic oxide film patterned by the same (U.S. Patent No. 9892959). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9892959

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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