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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9892949 B1

PDFFull Text
Date of Patent:
Feb. 13, 2018

Filed:

Dec. 08, 2016

Imprint method, imprint apparatus, and article manufacturing method

Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Kazuki Nakagawa, Utsunomiya, JP;

Noriyasu Hasegawa, Utsunomiya, JP;

Yosuke Murakami, Utsunomiya, JP;

Takahiro Matsumoto, Utsunomiya, JP;

Assignee:

CANON KABUSHIKI KAISHA, Tokyo, JP;

Attorney:

Fitzpatrick, Cella, Harper & Scinto

Primary Examiner:

Anthony Nguyen

Int. Cl.
CPC ...
B41L 35/14 (2006.01); H01L 21/68 (2006.01); G03F 7/00 (2006.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01); B29C 59/02 (2006.01); B29C 59/16 (2006.01); B29C 35/08 (2006.01); H01L 21/027 (2006.01); H01L 21/324 (2006.01); H01L 21/67 (2006.01); H01L 21/683 (2006.01); H01L 21/66 (2006.01); H01L 23/544 (2006.01); B29K 101/00 (2006.01); B29L 9/00 (2006.01); B29L 31/34 (2006.01);
U.S. Cl.
CPC ...
H01L 21/682 (2013.01); B29C 35/0805 (2013.01); B29C 59/026 (2013.01); B29C 59/16 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); G03F 7/0002 (2013.01); H01L 21/0271 (2013.01); H01L 21/324 (2013.01); H01L 21/6715 (2013.01); H01L 21/67115 (2013.01); H01L 21/6838 (2013.01); H01L 22/20 (2013.01); H01L 23/544 (2013.01); B29C 2035/0822 (2013.01); B29K 2101/00 (2013.01); B29L 2009/00 (2013.01); B29L 2031/34 (2013.01);
Abstract

An imprint apparatus forms a pattern of an imprint material on a substrate by using a mold. A substrate holding unit holds the substrate by a suction force between the substrate and a holding surface and includes a first suction unit for sucking a rear surface of a first region of the substrate with a first suction force and a second suction unit for sucking a rear surface of a second region of the substrate with a second suction force. A deformation mechanism deforms a shape of the first region in a direction along the holding surface when forming the pattern of the imprint material on the first region. An adjusting unit adjusts the first and second suction forces. The first suction force is less than the second in at least a portion of a period during the deforming of the shape of the first region by the deformation mechanism.

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