The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 13, 2018
Filed:
Apr. 07, 2009
Clay Kaytis, Burbank, CA (US);
John Edgar Park, Burbank, CA (US);
Gene Lee, Burbank, CA (US);
Philippe Brochu, Burbank, CA (US);
Hidetaka Yosumi, Burbank, CA (US);
Clay Kaytis, Burbank, CA (US);
John Edgar Park, Burbank, CA (US);
Gene Lee, Burbank, CA (US);
Philippe Brochu, Burbank, CA (US);
Hidetaka Yosumi, Burbank, CA (US);
Disney Enterprises, Inc., Burbank, CA (US);
Abstract
A method of manipulating at least a portion of a character model into a pose involving a library data having a plurality of deformations, where each deformation is associated with index values of one or more distance measurement nodes. One or more distance measurement nodes are defined for the portion of the character model, wherein each distance measurement node comprises a number of points on a surface defined by the geometry of the character model, wherein the points are separated by a distance value. A particular pose is selected for the character model portion to establish an initial model by selecting values for the pose controls. For the particular pose, a value of the distance measurement nodes is determined. At least one deformation is selected from the library data based in the value of the distance measurement nodes and applied to the initial model to generate a deformed model.