The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 13, 2018
Filed:
Nov. 10, 2016
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Ji Young Chu, Gyeongju-si, KR;
Shiva Ram Krishna, Suwon-si, KR;
Tae Hyun Kim, Suwon-si, KR;
Song Woo Bae, Seoul, KR;
Sang Don Jang, Suwon-si, KR;
Won Don Joo, Incheon, KR;
SAMSUNG ELECTRONICS, CO., LTD., Gyeonggi-Do, KR;
Abstract
Maskless lithographic apparatus measuring accumulated amount of light is provided. The maskless lithographic apparatus includes a light source which emits light, a stage on which a substrate is disposed, an optical system which converts the light into a beam spot array including a plurality of columns and a plurality of rows and irradiates the beam spot array onto the stage, a slit to which the beam spot array is irradiated and which passes an nth (n is a natural number) row of the beam spot array, an optical sensor which senses the nth row of the beam spot array which has passed through the slit, and a measuring unit which measures an accumulated amount of light in the nth row of the beam spot array sensed by the optical sensor.