The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 13, 2018
Filed:
Jun. 16, 2015
National Applied Research Laboratories, Taipei, TW;
Jiun-Woei Huang, Taipei, TW;
Shih-Feng Tseng, Hsinchu County, TW;
Jer-Liang Yeh, Hsinchu County, TW;
NATIONAL APPLIED RESEARCH LABORATORIES, Taipei, TW;
Abstract
A conjugate common light path lithography lens set includes a first, second, third, and fourth spherical mirrors, arranged sequentially, a spherical reflecting mirror arranged below the fourth spherical mirror, a first and second planar reflecting mirrors, inclinedly arranged above the first spherical mirror, so that a conjugate telecentric component pattern is formed to maintain an pattern of an object to have a non-deformed pattern after experiencing these optical components. As such, the omni-spherical mirror set and two kinds of optical material are mutually arranged to form the novel conjugate common light path lithography lens set. This may further achieve the function of the lithography lens, and have a direct effect on the manufacturing cost. And, the efficacies of reduced component number, easier manufacture of the optical components (satisfied with the lens manufacturing's experience equation), easier calibration, reduced chromatic abberation, optimized aperature F/#, and a reduced cost may be achieved.