The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 13, 2018
Filed:
Nov. 06, 2015
Applicant:
Shenzhen China Star Optoelectronics Technology Co., Ltd., Shenzhen, Guangdong, CN;
Inventor:
Yuan Xiong, Guangdong, CN;
Assignee:
SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD., Shenzhen, CN;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/42 (2012.01); G03F 1/44 (2012.01); G02B 5/20 (2006.01); G02F 1/1335 (2006.01); G03F 7/00 (2006.01); B05D 1/32 (2006.01);
U.S. Cl.
CPC ...
G02F 1/133516 (2013.01); B05D 1/32 (2013.01); G03F 1/42 (2013.01); G03F 1/44 (2013.01); G03F 7/0007 (2013.01); G02B 5/201 (2013.01);
Abstract
The present invention provides a color resist mask sheet and a method of use thereof. The color resist mask sheet includes an align coat mark region and an align test mark region. The align coat mark region includes a plurality of equally spaced align coat marks of coat color resist; the align test mark region includes a plurality of equally spaced align test marks for coating the test color resist, wherein each align test mark corresponds to each align coat mark.