The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 13, 2018
Filed:
Aug. 08, 2014
Mitsubishi Rayon Co., Ltd., Tokyo, JP;
Shinya Shakagoori, Yokohama, JP;
Hiroshi Onomoto, Otake, JP;
Makoto Ookawa, Yokohama, JP;
Kazuya Takanashi, Yokohama, JP;
Katsumi Hara, Yokohama, JP;
MITSUBISHI CHEMICAL CORPORATION, Tokyo, JP;
Abstract
This method for producing a mold for nanoimprinting in which a minute bumpy structure has been formed at the surface of a roller-shaped aluminum substrate of which the surface has been machined has: a polishing step for mechanically polishing the surface of the roller-shaped aluminum substrate, of which the surface has been machined, at least until the average crystal grain size changes; and a minute bumpy structure formation step for anodizing the aluminum substrate after the polishing step and forming a minute bumpy structure. The anti-reflective article has a minute bumpy structure at the surface, and in the wavelength region of visible light, has a color difference (E*) to the origin represented in the L*a*b* color system and derived by means of formula (1) of no greater than 0.9, or a chroma (C*) determined by means of formula (2) of no greater than 0.7.*={(*)+(*)+(*)}  (1)*={(*)+(*)}  (2)