The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 13, 2018
Filed:
Dec. 07, 2012
Applicant:
Georgia Tech Research Corporation, Atlanta, GA (US);
Inventors:
Rolando A. Gittens Ibacache, Atlanta, GA (US);
Jonathan Vernon, Atlanta, GA (US);
Kenneth H. Sandhage, Atlanta, GA (US);
Barbara D. Boyan, Atlanta, GA (US);
Assignee:
Georgia Tech Research Corporation, Atlanta, GA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 8/10 (2006.01); A61L 27/50 (2006.01); C23C 22/48 (2006.01);
U.S. Cl.
CPC ...
A61L 27/50 (2013.01); A61L 2400/12 (2013.01); A61L 2400/18 (2013.01); A61L 2420/02 (2013.01); Y10T 428/24355 (2015.01);
Abstract
The present invention provides implant devices comprising nanoscale structures on the surface thereof and methods of manufacturing such implant devices. In some embodiments, methods of manufacturing an implant device comprise exposing a surface of the implant device to an oxidative hydrothermal environment for a duration sufficient to generate nanoscale structures on the exposed surface(s) of the implant device.