The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 06, 2018
Filed:
Apr. 17, 2015
Christoph Mader, Muenster, DE;
Christian Guenther, Wuppertal, DE;
Joachim Erz, Schwoerstadt, DE;
Susanne Christine Martens, Essen, DE;
Jasmin Lehmkuhl, Haltern am See, DE;
Stephan Traut, Loerrach Brombach, DE;
Odo Wunnicke, Muenster, DE;
Christoph Mader, Muenster, DE;
Christian Guenther, Wuppertal, DE;
Joachim Erz, Schwoerstadt, DE;
Susanne Christine Martens, Essen, DE;
Jasmin Lehmkuhl, Haltern am See, DE;
Stephan Traut, Loerrach Brombach, DE;
Odo Wunnicke, Muenster, DE;
Evonik Degussa GmbH, Essen, DE;
Abstract
The present invention relates to a liquid-phase method for doping a semiconductor substrate, characterized in that a first composition containing at least one first dopant is applied to one or more regions of the surface of the semiconductor substrate, in order to create one or more region(s) of the surface of the semiconductor substrate coated with the first composition; a second composition containing at least one second dopant is applied to one or more regions of the surface of the semiconductor substrate, in order to create one or more region(s) of the surface of the semiconductor substrate coated with the second composition, where the one or more region(s) coated with the first composition and the one or more region(s) coated with the second composition are different and do not overlap significantly and where the first dopant is an n-type dopant and the second dopant is a p-type dopant or vice versa; the regions of the surface of the semiconductor substrate coated with the first composition and with the second composition are each fully or partly activated; optionally, the unactivated regions of the surface of the semiconductor substrate coated with the first composition and with the second composition are each oxidized; and the semiconductor substrate is heated to a temperature at which the dopants diffuse out of the coating into the semiconductor substrate. The invention further relates to the semiconductor obtainable by the method and to the use thereof, especially in the production of solar cells.