Method for manufacturing a wide bandgap junction barrier schottky diode

Abstract

A method for manufacturing a wide bandgap junction barrier Schottky diode having an anode side and a cathode side is provided, wherein an (n+) doped cathode layer is arranged on the cathode side, at least on p doped anode layer is arranged on the anode side, an (n−) doped drift layer is arranged between the cathode layer and the at least one anode layer, which drift layer extends to the anode side, wherein the following manufacturing steps are performed: a) providing an (n+) doped wide bandgap substrate, b) creating the drift layer on the cathode layer, c) creating the at least one anode layer on the drift layer, d) applying a first metal layer on the anode side on top of the drift layer for forming a Schottky contact, characterized in, that e) creating a second metal layer on top of at least one anode layer, wherein after having created the first and the second metal layer, a metal layer on top of the at least one anode layer has a second thickness and a metal layer on top of the drift layer has a first thickness, wherein the second thickness is smaller than the first thickness, f) then performing a first heating step at a first temperature, by which due the second thickness being smaller than the first thickness an ohmic contact is formed at the interface between the second metal layer and the at least one anode layer, wherein performing the first heating step such that a temperature below the first metal layer is kept below a temperature for forming an ohmic contact.