The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 06, 2018
Filed:
Dec. 12, 2016
Adobe Systems Incorporated, San Jose, CA (US);
Anant Gilra, Sunnyvale, CA (US);
ADOBE SYSTEMS INCORPORATED, San Jose, CA (US);
Abstract
Techniques are disclosed for removing blemishes from a digital image by detecting pixels containing the blemishes and replacing or blending those pixels with other pixels in the image that have a relatively low probability of containing a blemish. A standard pixel mask includes a user-selected region of the image; an extended mask extends beyond the user-selected region; and a minimal output pixel mask corresponds to the user-selected region. The minimal mask increases the transparency of some regions in the standard mask while maintaining the opacity of the standard mask in the blemish areas. Colors in the extended mask are weighted and clustered, and pixels in the minimal mask are assigned varying shades of transparency as a function of the color frequency. A blemish removal algorithm is applied using the minimal mask, with semi-transparent regions receiving a blend of source and patch pixel colors according to the level of transparency.