The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 06, 2018
Filed:
Apr. 20, 2015
Applicant:
Samsung Display Co., Ltd., Yongin, KR;
Inventors:
Yong Son, Suwon-si, KR;
Min Kang, Seoul, KR;
Bong Yeon Kim, Seoul, KR;
Hyun Joo Lee, Seoul, KR;
Jin Ho Ju, Seoul, KR;
Assignee:
Samsung Display Co., Ltd., Yongin-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/26 (2012.01); G03F 1/34 (2012.01); G03F 1/54 (2012.01); G03F 1/32 (2012.01);
U.S. Cl.
CPC ...
G03F 1/54 (2013.01); G03F 1/32 (2013.01);
Abstract
A phase shift mask enables much smaller scale of electronic circuit pattern. A phase shift mask comprises a transparent substrate, a phase shift pattern arranged on the transparent substrate to change a phase of light that penetrates the transparent substrate, and a metal coating layer arranged on at least a part of a surface of the phase shift pattern.