The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 06, 2018
Filed:
Nov. 29, 2012
Applicant:
Panasonic Corporation, Osaka, JP;
Inventor:
Tomohiro Okumura, Osaka, JP;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); H01L 21/326 (2006.01); C23C 16/505 (2006.01); H01J 37/32 (2006.01); B44C 1/22 (2006.01); C23C 16/513 (2006.01); H05H 1/30 (2006.01);
U.S. Cl.
CPC ...
C23C 16/505 (2013.01); B44C 1/227 (2013.01); C23C 16/513 (2013.01); H01J 37/321 (2013.01); H01J 37/32357 (2013.01); H05H 1/30 (2013.01);
Abstract
A plasma treatment apparatus that includes a chamber having an opening portion which serves as a plasma ejection port surrounded by a dielectric member; a gas supply pipe that introduces gas into an inside of the chamber; a solenoid coil disposed in a vicinity of the chamber; a high-frequency power supply having a pulse modulation function which is connected to the solenoid coil; and a base material mounting table disposed on a plasma ejection port side. Plasma can be stably generated using the plasma treatment apparatus.