The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 06, 2018

Filed:

Sep. 20, 2016
Applicant:

Shin-etsu Chemical Co., Ltd., Tokyo, JP;

Inventors:

Hiroyuki Yasuda, Tomioka, JP;

Michihiro Sugo, Takasaki, JP;

Masahito Tanabe, Annaka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09J 7/02 (2006.01); C09J 125/06 (2006.01); C09J 183/04 (2006.01); C09J 163/00 (2006.01); C09J 5/06 (2006.01); H01L 21/683 (2006.01); H01L 21/304 (2006.01); H01L 21/02 (2006.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
C09J 7/0242 (2013.01); C09J 5/06 (2013.01); C09J 7/0275 (2013.01); C09J 125/06 (2013.01); C09J 163/00 (2013.01); C09J 183/04 (2013.01); H01L 21/02057 (2013.01); H01L 21/304 (2013.01); H01L 21/6835 (2013.01); H01L 21/6836 (2013.01); H01L 21/76898 (2013.01); C09J 2203/326 (2013.01); C09J 2205/114 (2013.01); C09J 2205/302 (2013.01); C09J 2423/041 (2013.01); H01L 2221/6834 (2013.01); H01L 2221/68327 (2013.01);
Abstract

The present invention is a temporary adhesion method for temporarily bonding a support and a wafer via a temporary adhesive material, including attaching the wafer to the support via the temporary adhesive material including a complex temporary adhesive material layer that consists of a thermoplastic resin layer (A) exhibiting a storage modulus E' of 1 to 500 MPa and a tensile rupture strength of 5 to 50 MPa at 25° C. and a thermosetting polymer layer (B) exhibiting a storage modulus E′ of 1 to 1000 MPa and a tensile rupture strength of 1 to 50 MPa at 25° C. after curing, wherein the attaching is performed by forming the layer (A) on the front surface of the wafer from a liquid composition (A′), forming the layer (B) on the support by laminating a film resin (B′), and then heating the wafer and the support under reduced pressure, or forming the layer (A) on the front surface of the wafer from the liquid composition (A′), forming the layer (B) on the layer (A) by laminating the film resin (B′), and then heating the wafer and the support under reduced pressure, and heat curing the layer (B). This temporary adhesion method facilitates temporary adhesion and separation and can increase productivity of thin wafers.


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