The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 06, 2018
Filed:
Oct. 01, 2015
Applicant:
San Fang Chemical Industry Co., Ltd., Kaohsiung, TW;
Inventors:
Chung-Chih Feng, Kaohsiung, TW;
I-Peng Yao, Kaohsiung, TW;
Wen-Chieh Wu, Kaohsiung, TW;
Hsin-Ru Song, Kaohsiung, TW;
Assignee:
SAN FANG CHEMICAL INDUSTRY CO., LTD, Kaohsiung, TW;
Primary Examiner:
Int. Cl.
CPC ...
B24B 37/20 (2012.01); B24D 3/28 (2006.01); B24D 18/00 (2006.01);
U.S. Cl.
CPC ...
B24B 37/20 (2013.01); B24D 3/28 (2013.01); B24D 18/0027 (2013.01);
Abstract
The present invention relates to a polishing pad and a method for making the same. The polishing pad includes a polymeric elastomer and a plurality of hollow structures. The hollow structures are distributed in the polymeric elastomer uniformly, and the sizes of the hollow structures are substantially equal to each other.