The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 30, 2018

Filed:

Nov. 07, 2013
Applicants:

Institut National Des Sciences Appliquees, Rennes, FR;

Cnrs—centre Nationale DE LA Recherche Scientifique, Paris, FR;

Inventors:

Raphael Gillard, Rennes, FR;

Stephane Meric, Rennes, FR;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01Q 15/18 (2006.01); H01Q 3/46 (2006.01); H01Q 15/00 (2006.01);
U.S. Cl.
CPC ...
H01Q 3/46 (2013.01); H01Q 15/0013 (2013.01); H01Q 15/18 (2013.01);
Abstract

A dihedral shaped device is provided, which includes two plates forming between them an angle of [pi]−2[alpha], where 0<[alpha]<[pi]/4. Each plate has a ground plane, at least one dielectric layer and a network of radiating elements. An incident wave is reflected by the device by virtue of a double reflection from both plates. The network of radiating elements of each plate allows a phase shift to be generated, from the exterior towards the centre of the dihedron, along an axis perpendicular to an axis of intersection of the two plates, according to a set phase law, allowing a deviation to be introduced relative to a specular reflection for a given operating frequency.


Find Patent Forward Citations

Loading…