The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 30, 2018
Filed:
Jun. 17, 2015
Applicant:
National Technology & Engineering Solutions of Sandia, Llc, Albuquerque, NM (US);
Inventors:
Michael David Henry, Albuquerque, NM (US);
Rupert M. Lewis, Albuquerque, NM (US);
Assignee:
National Technology & Engineering Solutions of Sandia, LLC, Albuquerque, NM (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/48 (2006.01); H01L 39/24 (2006.01); H01J 37/305 (2006.01); H01J 37/21 (2006.01); H01B 12/02 (2006.01); H01L 39/02 (2006.01); H01L 39/12 (2006.01); H01L 39/22 (2006.01);
U.S. Cl.
CPC ...
H01L 39/249 (2013.01); H01B 12/02 (2013.01); H01J 37/21 (2013.01); H01J 37/3056 (2013.01); H01L 39/025 (2013.01); H01L 39/125 (2013.01); H01L 39/223 (2013.01); H01L 39/2406 (2013.01); H01L 39/2409 (2013.01); H01L 39/2416 (2013.01); H01L 39/2493 (2013.01); H01J 2237/213 (2013.01); H01J 2237/3175 (2013.01);
Abstract
The present invention relates to the use of gallium beam lithography to form superconductive structures. Generally, the method includes exposing a surface to gallium to form an implanted region and then removing material adjacent to and/or below that implanted region. In particular embodiments, the methods herein provide microstructures and nanostructures in any useful substrate, such as those including niobium, tantalum, tungsten, or titanium.