The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 30, 2018
Filed:
Apr. 16, 2015
Applicant:
Japan Display Inc., Minato-ku, JP;
Inventors:
Takaaki Kamimura, Tokyo, JP;
Noriyuki Hirata, Tokyo, JP;
Assignee:
Japan Display Inc., Minato-ku, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/12 (2006.01); H01L 29/66 (2006.01); H01L 21/3213 (2006.01); H01L 21/02 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1218 (2013.01); H01L 21/02063 (2013.01); H01L 21/31111 (2013.01); H01L 21/32134 (2013.01); H01L 27/1259 (2013.01); H01L 29/66757 (2013.01);
Abstract
According to one embodiment, a substrate for display device includes an insulating substrate and a conductive film formed on at least one main surface of the insulating substrate. As to the substrate in an etching process in which a fluoric acid solution containing 10% or more hydrogen fluoride is used, a first etching rate of the conductive film is substantially the same as a second etching rate of the insulating substrate, or the first etching rate is greater than the second etching rate.