The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 30, 2018

Filed:

Aug. 11, 2015
Applicant:

Adeka Corporation, Tokyo, JP;

Inventors:

Hiroki Sato, Tokyo, JP;

Junji Ueyama, Tokyo, JP;

Assignee:

ADEKA CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/28 (2006.01); C23C 16/40 (2006.01); C07F 11/00 (2006.01); C23C 16/455 (2006.01); H01L 29/51 (2006.01); H01L 21/285 (2006.01); H01L 21/768 (2006.01); H01L 29/49 (2006.01);
U.S. Cl.
CPC ...
H01L 21/28194 (2013.01); C07F 11/005 (2013.01); C23C 16/40 (2013.01); C23C 16/405 (2013.01); C23C 16/45553 (2013.01); H01L 21/28556 (2013.01); H01L 21/76841 (2013.01); H01L 29/4966 (2013.01); H01L 29/517 (2013.01); Y02E 10/541 (2013.01); Y02P 70/521 (2015.11);
Abstract

Disclosed is a method for manufacturing a molybdenum oxide-containing thin film, involving vaporizing a starting material for forming a thin film containing a compound represented by the following general formula (I) to give vapor containing a molybdenum amide compound, introducing the obtained vapor onto a substrate, and further introducing an oxidizing gas to cause decomposition and/or a chemical reaction to form a thin film on the substrate. In the formula, Rand Reach represents a straight or branched alkyl group having 1 to 4 carbon atom(s), Rrepresents a t-butyl group or a t-amyl group, y represents 0 or 2, x is 4 when y is 0, or x is 2 when y is 2, wherein Rand Rthat are plurally present may be the same or different.


Find Patent Forward Citations

Sato, Hiroki. (2018). Method for manufacturing molybdenum oxide-containing thin film (U.S. Patent No. 9881796). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9881796

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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