The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 30, 2018

Filed:

Jun. 24, 2015
Applicants:

Eyal Gordon, Haifa, IL;

Michael Slutsky, Kfar Saba, IL;

Yonatan Samet, Givataim, IL;

Inventors:

Eyal Gordon, Haifa, IL;

Michael Slutsky, Kfar Saba, IL;

Yonatan Samet, Givataim, IL;

Assignee:

MANTIS VISION LTD., Petach Tikua, IL;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06T 7/00 (2017.01); G06K 9/20 (2006.01); G06K 9/32 (2006.01); G06T 15/20 (2011.01); H04N 5/222 (2006.01); H04N 13/02 (2006.01); G06T 7/80 (2017.01); G06T 7/521 (2017.01); G06T 7/536 (2017.01);
U.S. Cl.
CPC ...
G06T 7/002 (2013.01); G06K 9/209 (2013.01); G06K 9/2036 (2013.01); G06K 9/3216 (2013.01); G06T 7/521 (2017.01); G06T 7/536 (2017.01); G06T 7/80 (2017.01); G06T 7/85 (2017.01); G06T 15/205 (2013.01); H04N 5/2224 (2013.01); H04N 13/0246 (2013.01); G06T 2200/04 (2013.01); G06T 2207/10021 (2013.01); G06T 2207/20228 (2013.01); G06T 2207/30204 (2013.01);
Abstract

A structured light projector includes an optical mask and a light emitter. The light emitter can be capable of illuminating the optical mask, and the optical mask can be capable of transforming the light from the emitter so as to provide structured light bi-dimensional coded light pattern that includes a plurality of feature types formed by a unique combination of feature elements. The projected light pattern includes one or more markers which include pairs of feature elements between which the epipolar distances are modified relative to distances between respective feature elements in non-marker areas of the pattern, and an appearance of feature elements within the marker and across the marker's edges is continuous.


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