The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 30, 2018
Filed:
May. 12, 2016
Inventec (Pudong) Technology Corporation, Shanghai, CN;
Inventec Corporation, Taipei, TW;
Cheng-Hsin Chen, Taipei, TW;
Chun-Hong Lin, Taipei, TW;
Chun-Chieh Chen, Taipei, TW;
Cheng-Hsiang Huang, Taipei, TW;
INVENTEC (PUDONG) TECHNOLOGY CORPORATION, Shanghai, CN;
INVENTEC CORPORATION, Taipei, TW;
Abstract
A restricted region transform method and a restricted region transform device are disclosed. The method includes following steps: reading out bare board information of a printed circuit board and layout information of a plurality of components, wherein the layout information of the plurality of components corresponds to a plurality of physical restricted regions; setting a first region according to edge information in the bare board information; setting a plurality of second regions according to projections of the plurality of physical restricted regions on a surface of the printed circuit board; selecting every two second regions, which overlap each other, among the plurality of second regions, and the selected second regions constituting a restriction conflict set; and selectively amending the second regions in the restriction conflict set to remove one or more overlaps from the second regions in the restriction conflict set.