The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 30, 2018

Filed:

Dec. 20, 2012
Applicant:

The Swatch Group Research and Development Ltd, Marin, CH;

Inventors:

Thierry Hessler, St-Aubin, CH;

Nicolas Rebeaud, Le Mont-sur-Lausanne, CH;

Jean-Luc Helfer, Le Landeron, CH;

David Richard, Yverdon-les-Bains, CH;

Sebastien Graf, Le Mont-sur-Lausanne, CH;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G04B 31/00 (2006.01); G04B 31/06 (2006.01); G04B 31/02 (2006.01); G04B 31/08 (2006.01); B23K 26/00 (2014.01); G04B 31/004 (2006.01); F16C 17/06 (2006.01); F16C 17/03 (2006.01); F16C 33/10 (2006.01); G04B 15/14 (2006.01); G04D 3/00 (2006.01);
U.S. Cl.
CPC ...
G04B 31/06 (2013.01); B23K 26/0063 (2013.01); G04B 31/00 (2013.01); G04B 31/004 (2013.01); G04B 31/02 (2013.01); G04B 31/08 (2013.01); F16C 17/03 (2013.01); F16C 17/06 (2013.01); F16C 33/10 (2013.01); G04B 15/14 (2013.01); G04D 3/0069 (2013.01); G04D 3/0071 (2013.01);
Abstract

A method for manufacturing a component in a substrate including: a) modifying a structure of at least one region of the substrate to make the at least one region more selective; and b) chemically etching the at least one region to selectively manufacture the component.


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