The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 30, 2018
Filed:
Feb. 13, 2015
Applicant:
Lg Chem, Ltd., Seoul, KR;
Inventors:
Jeongho Park, Daejeon, KR;
Jinmi Jung, Daejeon, KR;
Yujin Jeong, Daejeon, KR;
Bu Gon Shin, Daejeon, KR;
Assignee:
LG CHEM, LTD., Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/50 (2012.01); G03F 1/68 (2012.01); G03F 1/80 (2012.01); G03F 7/00 (2006.01); C23C 14/18 (2006.01); C23C 14/22 (2006.01); C23C 14/34 (2006.01); C23C 18/02 (2006.01);
U.S. Cl.
CPC ...
G03F 1/50 (2013.01); C23C 14/185 (2013.01); C23C 14/221 (2013.01); C23C 14/34 (2013.01); G03F 1/68 (2013.01); G03F 1/80 (2013.01); G03F 7/0002 (2013.01); C23C 18/02 (2013.01); G06F 2203/04102 (2013.01); G06F 2203/04103 (2013.01); G06F 2203/04112 (2013.01);
Abstract
The present invention relates to a method for manufacturing a master mold, a master mold manufactured by the method, a method for manufacturing a transparent photomask, a transparent photomask manufactured by the method, and a method for manufacturing a conductive mesh pattern by using the transparent photomask.