The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 30, 2018

Filed:

Jun. 15, 2011
Applicants:

Sundara Ramaprabhu, Chennai, IN;

Adarsh Kaniyoor, Chennai, IN;

Tessy Theres Baby, Chennai, IN;

Inventors:

Sundara Ramaprabhu, Chennai, IN;

Adarsh Kaniyoor, Chennai, IN;

Tessy Theres Baby, Chennai, IN;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C01B 31/02 (2006.01); C01B 31/04 (2006.01); B82Y 30/00 (2011.01); B82Y 40/00 (2011.01); B01J 15/00 (2006.01); B01J 19/00 (2006.01); B01J 19/18 (2006.01);
U.S. Cl.
CPC ...
C01B 31/043 (2013.01); B01J 15/00 (2013.01); B01J 19/0066 (2013.01); B01J 19/18 (2013.01); B82Y 30/00 (2013.01); B82Y 40/00 (2013.01); C01B 31/0476 (2013.01); B01J 2219/00006 (2013.01); B01J 2219/00074 (2013.01);
Abstract

Technologies are generally described for forming graphene and structures including graphene. In an example, a system effective to form graphene may include a chamber adapted to receive graphite oxide. The system may also include a source of an inert gas and a source of hydrogen, which may both be configured in communication with the chamber. A processor may be configured in communication with the chamber, the inert gas source and/or the hydrogen source. The processor may be further configured to control the flow of the inert gas from the first source through the chamber under first sufficient reaction conditions to remove at least some oxygen from the atmosphere of the chamber. The processor may also be configured to control the flow of the hydrogen from the second source to the graphite oxide in the chamber under second sufficient reaction conditions to form graphene from the graphite oxide.


Find Patent Forward Citations

Loading…